Modeling of cathodoluminescence and photoluminescence properties of pulsed laser-deporited europium-activated yttrium oxide thin film phosphors

摘要

Europium-activated yttrium oxide (Eu:Y_2O_3) thin films were deposited on (100) silicon and (0001) sapphire substrates using 248 nm KrF pulsed laser. To investigate the effect of the Eu:Y_2O_3film roughness on cathodluminescence (CL) and photoluminescence (PL) properties, the substrate surfaces with various roughnesses were used. The roughness was found to play an important role in determining CL and PL brightness of the Eu:Y_2O_3 films. The improvement in brightness by increasing the film roughness is due to increase in total protion of light that escapes from the surface of the phosphor film. A model has been proposed which supports strongly htis explanation. Our results show that depositions with slower growty rate and lower laser energy are more important parameters than increasing the roughness to improve CL brightness of the Eu:Y_2O_3 thin film phosphors.