首页> 外文会议>Symposium on Flat-Panel Displays and Sensors-Principles, Materials and Processes held April 4-9, 1999, San Francisco, California, U.S.A. >A high-voltage hydrogenated amorphous silicon thin-film transistor for reflective active-matrix cholesteric LCD
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A high-voltage hydrogenated amorphous silicon thin-film transistor for reflective active-matrix cholesteric LCD

机译:用于反射型有源矩阵胆甾型液晶显示器的高压氢化非晶硅薄膜晶体管

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摘要

A high-voltage hydrogenated amorphous silicon thin film transistor (HV a-Si:H TFT) with thick double layer gate insulator (approx 0.95 mu m) has been developed for refelective active-matrix cholesteric liquid crystal displays. The double layer gate insulator consists of 0.85 and 0.10 mu m thick benzocyclobutene and hydrogenated amorphous silicon nitride, respectively. This HV a-Si:H TFT operates at the gate-to-source and drain-tosource biases up to 100V without any serious leakage current degradaton and device breakdown.
机译:已经开发出具有厚双层栅绝缘体(约0.95μm)的高压氢化非晶硅薄膜晶体管(HV a-Si:H TFT),用于反射型有源矩阵胆甾型液晶显示器。双层栅极绝缘体分别由0.85和0.10μm厚的苯并环丁烯和氢化的非晶氮化硅组成。该HV a-Si:H TFT在栅极至源极和漏极至源极的偏置电压高达100V的条件下工作,而不会造成严重的泄漏电流降低和器件击穿的情况。

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