首页> 外文会议>Symposium on Covalently Bonded Disordered Thin-Film Materials held December 2-4, 1997, Boston, Massachusetts, U.S.A. >Doping induced internal stress reduction in diamondlike carbon films deposited by pulsed laser ablation
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Doping induced internal stress reduction in diamondlike carbon films deposited by pulsed laser ablation

机译:脉冲激光烧蚀沉积的类金刚石碳膜中掺杂引起的内应力降低

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We have investigated the effect of dopants on the reduction of internal compressive stress in diamond-like carbon (DLC) films prepared by pulsed laser deposition on Si(100) substrates. A novel target configuration was used to incorporate dopants into DLC films by sequential pulsed laser ablation of two targets. These dopants include copper, titanium and silicon. The thickness of the DLC films deposited was measured in the range 400nm - 600nm using a profilometer. Raman spectroscopy was employed to analyze the chemistry of the films. The shifts of the G-peak position in the Raman spectrum, due to different concentrations of dopant, were used to estimate the internal stress changes. All of the films showed a Raman spectrum typical of DLC films containing a high fraction of sp~3 species, with the G-peak centered at around 1510-1560cm~(-1). The shift of the G-peak due to the presence of dopants was observed for all the DLC films as compared to the undoped one. It was found that Ti has the strongest tendency to reduce the compressive stress of DLC films. This effect increases with increasing concentration of dopants. Silicon was also observed to have this effect, but the G-peak position did not appear to shift with different Si concentrations. Buckling occurred in the as-deposited, undoped DLC film because of the relief of the large compressive stress accumulated in the film, while all the doped DLC films showed good adhesion to the substrate. The results are discussed combining the atomic structure of DLC and the structure and properties of the dopants.
机译:我们已经研究了在Si(100)衬底上通过脉冲激光沉积制备的类金刚石碳(DLC)膜中掺杂剂对减少内部压应力的影响。一种新颖的靶结构被用于通过两个靶的顺序脉冲激光烧蚀将掺杂剂掺入DLC膜中。这些掺杂剂包括铜,钛和硅。使用轮廓仪在400nm-600nm范围内测量沉积的DLC膜的厚度。拉曼光谱法用于分析膜的化学性质。由于掺杂剂浓度不同,拉曼光谱中G峰位置的变化被用于估算内部应力变化。所有这些膜均显示出典型的DLC膜的拉曼光谱,其中包含较高比例的sp〜3物种,G峰的中心位于1510-1560cm〜(-1)左右。与未掺杂的所有DLC膜相比,观察到所有DLC膜由于掺杂剂的存在引起的G峰移动。发现Ti具有降低DLC膜的压应力的最强趋势。随着掺杂剂浓度的增加,该效应增加。还观察到硅具有这种作用,但是在不同的Si浓度下,G峰的位置似乎没有发生变化。沉积后的未掺杂DLC薄膜会发生屈曲,这是因为薄膜中积累的大压缩应力得以缓解,而所有掺杂的DLC薄膜均显示出对基材的良好粘合性。结合DLC的原子结构以及掺杂剂的结构和性质,讨论了结果。

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