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High performance GaN-based light-emitting diodes with geometric GaN shaping structure

机译:具有几何GaN整形结构的高性能GaN基发光二极管

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摘要

InGaN-GaN light emitting diodes (LEDs) with p-roughened surface and n-bowl structure were fabricated by low temperature growing, ICP etching, wafer-bonding, and laser lift-off technologies. Ni/Ag/Ni mirror was introduced on the n-bowl surface. It was found the light intensity of PRUB-LEDs with different bowl size are all higher than PR-LED. The intensity of PRUB-LED with 3 μm bowls was 2.33 times higher than that of the PR-LED.
机译:通过低温生长,ICP蚀刻,晶圆键合和激光剥离技术制造了具有p型粗糙表面和n碗结构的InGaN-GaN发光二极管(LED)。在n型碗表面引入Ni / Ag / Ni镜。发现不同碗大小的PRUB-LED的光强度均高于PR-LED。碗为3μm的PRUB-LED的强度是PR-LED的2.33倍。

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