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Signal formation in depth-scanning 3D interference microscopy at high numerical apertures

机译:深度扫描3D干涉显微镜在高数值孔径下的信号形成

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Increasing capabilities in precision manufacturing and micro technology are accompanied by increasing demands for high precision industrial metrology systems. With respect to optical metrology especially the lateral resolution capabilities of an optical profiler gains in importance. If, in addition, nanometer height resolution is needed interferometers seem to be the most promising instruments. This contribution focuses on interference microscopes using objective lenses of high numerical apertures in order to reach high lateral resolution. Increasing the numerical aperture influences both, the envelope as well as the phase of interference signals obtained by a so-called depth scan, i. e. changing the distance between the measuring object and the interference microscope. The depth of focus of a high numerical aperture objective limits the width of the signal envelope simultaneously increasing the fringe spacing which results in a longer effective wavelength. We demonstrate the practical consequences of these effects using a self-assembled Linnik interferometer of 0.9 numerical aperture. Phenomena resulting from concrete measuring objects will be discussed: Step height structures may lead to a further change of the effective wavelength as a consequence of changes in the signal spectrum due to interference phenomena within a single Airy disk. This may influence the lateral resolution of an interference microscope for a specific measurement task. In addition, a strong dependence of the measurement results on either TE or TM polarization occurs if step height structures are measured. Modeling the polarization dependence requires to consider the angle dependence of Fresnel reflection coefficients and edge diffraction phenomena. Although the maximum measurable surface slope of a tilted surface can be increased by increasing the numerical aperture there is a limitation due to the fringe density compared to the optical resolution of the microscope as it will be demonstrated by measurement results obtained from a chirp-shaped surface standard.
机译:精密制造和微技术能力的提高伴随着对高精度工业计量系统的日益增长的需求。关于光学计量学,光学轮廓仪的横向分辨率能力尤其重要。此外,如果需要纳米高度分辨率,则干涉仪似乎是最有前途的仪器。该贡献集中在使用高数值孔径物镜的干涉显微镜上,以达到较高的横向分辨率。增加数值孔径会影响包络以及通过所谓的深度扫描(即深度扫描)获得的干扰信号的相位。 e。改变测量对象和干涉显微镜之间的距离。高数值孔径物镜的聚焦深度限制了信号包络线的宽度,同时增加了条纹间距,从而导致更长的有效波长。我们使用0.9数值孔径的自组装Linnik干涉仪演示了这些效应的实际后果。将讨论由具体的测量对象引起的现象:台阶高度结构可能会由于单个艾里斑盘内的干扰现象而引起的信号频谱变化而导致有效波长的进一步变化。对于特定的测量任务,这可能会影响干涉显微镜的横向分辨率。此外,如果测量台阶高度结构,则测量结果对TE或TM偏振的依赖性很大。对偏振相关性进行建模需要考虑菲涅耳反射系数和边缘衍射现象的角度相关性。尽管可以通过增加数值孔径来增加倾斜表面的最大可测量表面斜率,但是与显微镜的光学分辨率相比,由于条纹密度的限制,因此存在局限性,这将由from形表面的测量结果来证明标准。

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