【24h】

Session 2 overview: High-bandwidth DRAM PRAM: Memory subcommittee

机译:第2部分概述:高带宽DRAM和PRAM:存储器小组委员会

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摘要

VLSI applications today require high-volume power-efficient DRAM. Achieving high bandwidth at low voltages remains a significant challenge for DRAM design. In ISSCC 2012, a new DDR4 4Gb DRAM demonstrates a data rate up to 3.2Gb/s/pin for server applications. A new LPDDR3 4Gb DRAM for mobile applications has a data rate up to 1.6Gb/s/pin. DRAM technology has advanced to 23nm and 4Gb density is becoming mainstream. For the emerging memory technology of PRAM (phase-change RAM), an 8Gb chip is realized with the minimum feature-size of 20nm. Significant progress is also made in the TSV (through-silicon via) technology along with new I/O circuit design for more power-efficient memory interfaces. The papers in this session present the latest technologies and high-bandwidth circuit techniques to improve the performance and density of both DRAM and PRAM.
机译:当今的VLSI应用需要大容量节能的DRAM。在低压下实现高带宽仍然是DRAM设计面临的重大挑战。在ISSCC 2012中,新的DDR4 4Gb DRAM演示了服务器应用程序的数据速率高达3.2Gb / s / pin。面向移动应用的新型LPDDR3 4Gb DRAM的数据速率高达1.6Gb / s / pin。 DRAM技术已经发展到23nm,4Gb密度正成为主流。对于PRAM(相变RAM)的新兴存储技术,实现了最小特征尺寸为20nm的8Gb芯片。 TSV(硅直通)技术以及新的I / O电路设计(用于更节能的存储器接口)也取得了重大进展。本届会议上的论文介绍了最新技术和高带宽电路技术,以提高DRAM和PRAM的性能和密度。

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