Magnetotransport Studies in Co/Cu and Ag Nano-structure Films Preparedby Pulse Electrochemical Deposition

摘要

The magnetotransport properties in Co/Cu, Ag multilayer films with layers produced in thernatomic level by pulse electrodeposition method have been investigated. Magnetoresistivity, Δρ/ρrnincreases with increasing Co layer thickness and reaches a maximum in the neighborhood of 10rn～15 ? and 15 ～ 20 ? for the electrodeposited Co/Cu and Co/Ag multilayers, respectively. On thernapplication of strain, these electrodeposited films show useful magnetic anisotropy properties.rnThe magnetoresistance effect has two components: isotropic and anisotropic. The disparity in thernmagnetotransport properties seems to arise from the magnetic orientation in the ferromagneticrnlayer on both the isotropic and anisotropic films.