SOME PRACTICAL EXAMPLES OF DIAMOND MICROELECTROMECHANICAL STRUCTURES (DMEMS)

摘要

CVD (chemically vapor deposited) diamond films are processed similar to "conventional" semiconductor device fabrication to achieve diamond micro-electromechanical structures (DMEMS). An attractive feature of these diamond films is their ability to be an excellent dielectric (undoped, resistivity > 10~(14) ohm-cm to > 400℃) or an interesting semiconductor/conductor (doped, resistivity ～ < 1 to 1 Kohm-cm). Sequential microelectronic processing has been combined with CVD diamond technology to arrive at a "wafer fabrication" approach to achieve diamond pressure sensors and accelerometers that can perform in extreme conditions. This paper will review the design and behavior of the next generation DMEMS devices for extreme conditions and will describe the behavior of a diamond emission triode.