Fabrication of Soft X-Ray Multilayer Mirrors by means of Ion Beam Sputtering

摘要

We fabricated Mo/Si soft x-ray multilayer mirrors on Si wafer and polished ceramic glass (CLEARCERAM-Z) substrates by ion beam sputtering method. The dpeosition system was pumped down to a base pressure of 2x10~-6 Pa and working pressure was around 2x10~-2 Pa. The Ar ion gun was operated at 1000V for acceleration with an ion beam current of 50mA. Si and Mo target plates were mounted on a water-cooled holder and particular target was selected by rotating the holder. Substrates were rotated similarly to the planetary motion for thickness uniformity. Deposition on substrates was carried out at an ambient temperature, and layer thickness was controlled by deposition time through fabrication.