【24h】

Experiment Study on Beryllium and Copper Alloy Joints by Hot Isostatic Pressing Bonding

机译:热等静压焊接铍和铜合金接头的实验研究

获取原文
获取原文并翻译 | 示例

摘要

Performances of Be/Cu joints fabricated by hot isostatic pressing (HIP) bonding were studied by means of various test methods, such as shearing test, scanning electron microscopy(SEM) observation, energy dispersion spectrometer(EDS) and X-ray Diffraction (XRD) analysis, when Ti (PVD-coated on Be)/Cu (PVD- coated on CuCrZr) interlayers were used. This study considered several diffusion surface treatments (such as chemical etching, polishing, etc.) for minimizing or eliminating the effects of the oxide film on beryllium to promote good diffusion bond between these materials. Experiments indicated that the joints HIPed at 580℃/145MPa/2h showed high shearing strength (up to123MPa) at room temperature and no defect such as cracks was observed at the bonding interface dut to the role of the etching with a dilute acid solution to remove native oxide films on beryllium surface prior to titanium coating. The strength moderately decreased when the diffusion holding time increased from 2h to 4h. The thin titanium diffusion barrier (~10μm) which was coated on the beryllium surface have prevented the reaction between Be and Cu, but CuTi phase was formed at Ti/Cu interface. It is considered the phase limited the bonding strength to higher level.
机译:通过剪切试验,扫描电子显微镜(SEM)观察,能谱仪(EDS)和X射线衍射(XRD)等多种测试方法研究了通过热等静压(HIP)键合制备的Be / Cu接头的性能。 )分析,当使用Ti(在Be上镀PVD)/ Cu(在CuCrZr上镀PVD)中间层时。这项研究考虑了几种扩散表面处理(例如化学蚀刻,抛光等),以最小化或消除氧化膜对铍的影响,从而促进这些材料之间的良好扩散结合。实验表明,在580℃/ 145MPa / 2h时,HIP接头在室温下显示出高剪切强度(最高123MPa),并且在结合界面上未观察到缺陷(如裂纹),这是由于稀酸溶液腐蚀导致的。在钛涂层之前,在铍表面上形成天然氧化膜。当扩散保持时间从2h增加到4h时,强度适度降低。覆盖在铍表面的薄的钛扩散阻挡层(〜10μm)阻止了Be与Cu之间的反应,但在Ti / Cu界面形成了CuTi相。认为该相将粘结强度限制在较高水平。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号