首页> 外文会议>Proceeding of the 1995 IEEE 5th international conference on conduction and breakdown in solid dielectrics >Interpretation of atomic force microscope (AFM) signals from surface charge on insulators
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Interpretation of atomic force microscope (AFM) signals from surface charge on insulators

机译:绝缘子表面电荷对原子力显微镜(AFM)信号的解释

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The surface of an insulator can accumulate charge by a variety of means. There is a need for good experimental procedures to measure these surface charge densities. The most promising new method is to use an atomic force microscope (AFM). Resolutions of the order of 100 nm have been reported (Stern et al [1], Guethner et al [2], Uchihashi et al [3], while 10 nm has been claimed (Cahur [4]). The vastly improved resolution compared with the previous methods, coupled with use in the ambient atmosphere, mean that this method will become widely used. The observed signals show a spatial spreading and a temporal decay. In this paper we show how these measurements can be related to the physical mechanisms causing charge motion on the surface and within the bulk of the sample.
机译:绝缘体的表面可以通过多种方式积聚电荷。需要良好的实验程序来测量这些表面电荷密度。最有希望的新方法是使用原子力显微镜(AFM)。据报道分辨率为100 nm(Stern等人[1],Guethner等人[2],Uchihashi等人[3]),而声称具有10 nm的分辨率(Cahur [4])。与以前的方法一起使用,再加上在大气中的使用,意味着该方法将被广泛使用,观察到的信号显示出空间扩展和时间衰减,在本文中,我们展示了这些测量如何与引起这种现象的物理机制相关。电荷在样品的表面和大部分内的运动。

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