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Sol-gel method of p-type zinc oxide films preparation

机译:p型氧化锌薄膜制备的溶胶-凝胶法

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摘要

Both n-type and p-type ZnO will be required for development of homojunction light-emitting diodes and laser diodes. It is easy to obtain strong n-type ZnO, but very difficult to create consistent, reliable, high-conductivity p-type material. Here we present our investigations of p-type ZnO thin film preparation by sol-gel method using single Li doping and Ga(Al)+N codoping technique. ZnO thin films with c-axis orientation have been prepared on glass substrates. Zn acetate dihydrate, gallium nitrate and acetamide were used as zinc, gallium and nitrogen precursors respectively. SEM, X-ray diffraction, electric conductivity and Hall effect measurements were carried out. The results show that p-type conducting ZnO films with hole concentrations as high as 5×10~(17) cm~(-3) were obtained by this method.
机译:n型和p型ZnO都需要用于开发同质结发光二极管和激光二极管。容易获得强n型ZnO,但很难制造出一致,可靠,高电导率的p型材料。在这里,我们介绍我们的研究通过溶胶凝胶法使用单一的Li掺杂和Ga(Al)+ N共掺杂技术制备p型ZnO薄膜。已经在玻璃基板上制备了具有c轴取向的ZnO薄膜。二水合乙酸锌,硝酸镓和乙酰胺分别用作锌,镓和氮的前体。进行了SEM,X射线衍射,电导率和霍尔效应测量。结果表明,采用该方法得到的p型导电ZnO薄膜的空穴浓度高达5×10〜(17)cm〜(-3)。

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