Towards Pure Carbon- Ultra high carbon fullerene based spin-on organic hardmasks

摘要

Irresistible Materials has previously introduced the HM340 and HM940 series of fullerene based spin-on carbonhardmasks, and reported on material characterization, including very high carbon content and high thermalstability. The materials have a low Ohnishi number providing high etch durability and the low hydrogen levelallows for high-resolution etching without wiggling. In order to further increase thermal stability and etchresistance several new formulations are under development, including fullerene only hardmask materialsHere we present the latest results for our more conventional HM940 series, avoiding the drain test issuesencountered with higher concentration HM340 formulations, together with new and updated characterisationresults for the more advanced formulations.