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Silicon-wires and Compact Multi-mode Interference Splitters with an Uneven Splitting-ratio

机译:具有不均匀分配比的硅线和紧凑型多模干扰分配器

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摘要

We report the fabrication and accurate measurement of propagation and bending losses in silicon wires with submicron dimensions fabricated on silicon-on-insulator wafer. Propagation loss of 0.71±0.03dB/mm for the TE polarization was measured at the 1.55μm. Loss of per 90° bend is measured to be 0.01dB for a bending radius of 5μm. Three types of compact MMI splitters with different splitting-ratios were fabricated and measured. The splitting-ratios are respectively 50:50, 15:85 and 28:72. They exhibited low excess losses of about 1.5~3.9dB. The splitting-ratios were consistent with the design values.
机译:我们报告了绝缘体上硅晶片上制造的亚微米尺寸硅线的传播和弯曲损耗的制造和精确测量。在1.55μm处测得的TE极化传播损耗为0.71±0.03dB / mm。对于5μm的弯曲半径,每90°弯曲的损耗测得为0.01dB。制作并测量了三种具有不同分离比的紧凑型MMI分离器。分裂比分别为50:50、15:85和28:72。它们表现出低的约1.5〜3.9dB的过大损耗。分离比与设计值一致。

著录项

  • 来源
    《Passive components and fiber-based devices VI》|2009年|P.763010.1-763010.6|共6页
  • 会议地点 Shanghai(CN)
  • 作者单位

    Institute of Microelectronics of Chinese Academy of Sciences 3 Beitucheng West Road, Chaoyang District, Beijing, PR China;

    Institute of Microelectronics of Chinese Academy of Sciences 3 Beitucheng West Road, Chaoyang District, Beijing, PR China;

    Institute of Microelectronics of Chinese Academy of Sciences 3 Beitucheng West Road, Chaoyang District, Beijing, PR China;

    Institute of Microelectronics of Chinese Academy of Sciences 3 Beitucheng West Road, Chaoyang District, Beijing, PR China;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 光纤元件;
  • 关键词

    silicon-wires; MMI; uneven splitting-ratio;

    机译:硅线; MMI;不均匀分割率;

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