aCollege of Mechatronic Engineering and Automation, National University of Defense Technology, Changsha, Hunan 410073, P.R. China;
aCollege of Mechatronic Engineering and Automation, National University of Defense Technology, Changsha, Hunan 410073, P.R. China;
aCollege of Mechatronic Engineering and Automation, National University of Defense Technology, Changsha, Hunan 410073, P.R. China;
aCollege of Mechatronic Engineering and Automation, National University of Defense Technology, Changsha, Hunan 410073, P.R. China;
nanoparticle SiO_2 jet polishing; fused silica; HF acid dynamic etching; In-situ detection; elastic domain processing; laser-induced damage threshold;
机译:射流抛光法研究熔融石英光学元件的激光损伤抗性
机译:胶态二氧化硅和二氧化铈抛光的熔融石英光学元件的表面缺陷表征和激光诱导的损伤性能
机译:熔融石英光学系统中抛光引起的浅层次表面损伤与激光引起的灰霾损伤的相关性
机译:弹性区域纳米粒子SiO_2喷射抛光对熔融二氧化硅激光损伤性能的影响
机译:熔融石英中的高功率激光损坏。
机译:通过连续照射能量密度低于激光诱发损伤阈值的飞秒激光观察和分析熔融石英的结构变化
机译:焊盘弹性模量对抛光诱导塑料地下损伤分布熔融石英光学的影响
机译:CO sub 2 - 激光二氧化硅表面的激光抛光,增加了1.06μm的激光损伤抗性