Study of photoresist pregrooved structures

机译：光刻胶预刻槽结构的研究

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Abstract: Theoretical and experimental profiles of pregrooved cross-section in coated photoresist layers with a thickness of 470 nm and 150 nm on glass substrates are given. The experiment has been performed on the photoresist cutting machine using focused argon laser beam and AZ-1350 photoresist. The results from scanning tunneling microscope (STM) and scanning electron microscope (SEM) images are also discussed. !3

机译：摘要：给出了玻璃基板上厚度分别为470 nm和150 nm的涂层光致抗蚀剂层中预刻槽横截面的理论和实验轮廓。该实验已在使用聚焦氩激光束和AZ-1350光刻胶的光刻胶切割机上进行。还讨论了扫描隧道显微镜（STM）和扫描电子显微镜（SEM）图像的结果。！3

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来源
《Optical Storage: Third International Symposium》|1992年|p.126-129|共4页
会议地点 Kunming(CN);Kunming(CN)
作者
Changjiu Jiang; Shanghai Metallurgic Institute; Shanghai; China; Weidong Yang; Shanghai Metallurgic Institute; Shanghai; China; Lijuan Wang; Shanghai Metallurgic Institute; Shanghai; China; Dawen Wang; Institute of Chemistry; Beijing; China; Chunli Bai; I;
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正文语种 eng
中图分类无线电电子学、电信技术;
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3. Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposures. II. Plasma parameter trends for photoresist degradation [J] . M. Sumiya, R. Bruce, S. Engelmann, Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2008,第5期

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4. Study of photoresist pregrooved structures [C] . Changjiu Jiang, Weidong Yang, Lijuan Wang, International symposium on optical storage . 1993

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5. Design and study of advanced photoresist materials: Positive tone photoresists with reduced environmental impact and materials for 157 nm lithography. [D] . Yamada, Shintaro. 2000

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Study of photoresist pregrooved structures

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