A Comparative Study of Self-Aligned Quadruple and Sextuple Patterning Techniques for Sub-15nm IC Scaling

摘要

Self-aligned multiple patterning (SAMP) techniques can potentially scale integrated circuits down to half-pitch 7nm. In this paper, we present a comparative analysis of self-aligned quadruple (SAQP) and sextuple (SASP) techniques by investigating their technological merits and limitations, process complexity and cost structures, strategy of layout decomposition/synthesis, and yield impacts. It is shown that SASP process complexity is comparable to that of SAQP process, while it offers 50% gain in feature density and may be extended for one more node. The overlay yield of cut process is identified to be a challenge when the minimum device feature is scaled to half-pitch 7nm. The mask design issues for various applications using each technique are discussed, and the corresponding layout decomposition/synthesis strategy for complex 2D patterning is proposed. Although the high-dose EUV single-cut process can save significant costs when applied to replace the 193i multiple-cut process to form fin/gate structures, our cost modeling results show that SADP+EUV approach is still not cost effective for patterning other critical layers that generally require the same mask number (and lithographic steps) as the non-EUV schemes.