Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China;
State Key Laboratory of Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074, China;
Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China State Key Laboratory of Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074, China;
Inverse Lithography Technology (ILT); computational efficiency; manufacturability; regularization; mask filtering technique; edge distance error (EDE);
机译:针对反光刻的基于像素的稳健源和掩模优化
机译:基于像素的快速掩模优化以实现反光刻
机译:基于线搜索的反光刻技术在掩模设计中的应用
机译:基于像素的逆光刻使用掩模过滤技术
机译:基于线路搜索的掩模设计的逆光刻技术
机译:波束形成结构中反向倒谱白化滤波器和自适应FIR滤波器的基于创新的噪声消除技术
机译:基于线搜索的反光刻技术在掩模设计中的应用
机译:使用阴影技术制作的X射线掩模在大约100 a线宽下进行X射线光刻