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PRESSURE-INDUCED DEFECTS IN ZIRCONATES

机译:锆酸盐的压力引起的缺陷

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Defects, e.g. vacancies and interstitials, play an important role on the physical properties of oxides, especially on their ionic transport. Those defects in oxides are generally controlled and analyzed as functions of dopant concentration, c, temperature, 7", and oxygen chemical potential, □o2, but not of total pressure, P. This is not surprising given that a molar volume, V_m, of solids is much smaller than that of gas phase by a factor of ≈1/1000. Meanwhile, under high pressure such as several GPa, the effect of total pressure on free energy, i.e. V_m㉑P, reaches 20~100 kJ/mol, which is high enough to affect the defect formation and migration in solids. In fact, pressure-induced phenomena are recently of great interest in solid state ionics. In this study, we focus on the pressure effects on the defect formation in some stabilized ZrO_2 and acceptor-doped BaZrO_3. For Y-stabilized ZrO_2, reduction was found to be enhanced under high pressure. Figure 1 shows the lattice constant of 8YSZ electrochemically reduced under high pressure as a function of oxygen deficiency introduced. Under high pressure such as 1 to 6 GPa, 8YSZ was easily reduced even at 3Vdc at 500℃. The oxygen deficiency reaches □ = 0.05. Unlike reduced CeO_2 which shows lattice expansion, the reduced 8YSZ shows 0.5% smaller lattice constant. The lattice shrinkage was also confirmed by DFT calculations. This supports that applying high pressure, which in general enhances a reaction with negative volume change, enhances the reducing reaction of cubic ZrO_2. Figure 2 shows the temperature dependence of electrical conductivity of reduced 8YSZ. The reduced 8YSZ appears to show mixed ionic and electronic conduction; major carrier is electrons. Acceptor-doped BaZrO_3 was also subjected to high pressure on the order of GPa. Their defect equilibrium and proton conductivity will be also discussed.
机译:缺陷,例如空位和填隙对氧化物的物理性能,尤其是其离子迁移起重要作用。氧化物中的那些缺陷通常根据掺杂剂浓度c,温度7“和氧化学势□o2而不是总压力P的函数进行控制和分析。考虑到摩尔体积V_m固相的体积比气相的固相体积小约1/1/1000,同时,在高压下,例如几GPa,总压力对自由能的影响,即V_m㉑P,达到20〜100 kJ / mol,高到足以影响固体中缺陷形成和迁移的程度。实际上,压力诱导现象在固态离子中引起了人们的极大兴趣。在这项研究中,我们集中于压力对某些稳定ZrO_2和受体上缺陷形成的影响掺杂的BaZrO_3。对于Y稳定的ZrO_2,发现在高压下还原性增强。图1显示了在高压下电化学还原的8YSZ的晶格常数随引入的氧缺乏而变化。在高压下(例如1至6 GPa) ,8YSZ即使在500℃3Vdc下也很容易降低。缺氧达到□= 0.05。与还原的CeO_2表现出晶格膨胀不同,还原的8YSZ显示出0.5%的晶格常数小。通过DFT计算也证实了晶格收缩。这支持施加高压通常增强立方体积的ZrO_2的还原反应,而高压通常会增强负体积变化的反应。图2显示了降低的8YSZ的电导率与温度的关系。还原的8YSZ似乎显示出混合的离子和电子传导;主要载体是电子。掺杂受体的BaZrO_3也经受了GPa量级的高压。他们的缺陷平衡和质子传导性也将被讨论。

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