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Room temperature continuous wave lasing of GaN-based green vertical-cavity surface-emitting lasers

机译:GaN基绿色垂直腔面发射激光器的室温连续波激射

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摘要

Green vertical-cavity surface-emitting lasers (VCSELs) were fabricated with two different kinds of gain medium, agreen-emitting InGaN quantum dot (QD) active region and a normally blue-emitting quantum well (QW) active region.The VCSELs have dual dielectric DBRs and room temperature (RT) continuous wave (CW) lasing was observed in bothtype VCSELs. For the QD VCSELs, lasing at different wavelengths from 491.8 to 565.7 nm was obtained, coveringmost of the “green gap”. The lasing wavelength could be controlled by adjusting the cavity length, and the devices werefeatured with low threshold current of less than 1 kA/cm~2. For the QW VCSELs, the emission peak of active layer isaround 445nm, dominantly in the blue. However, lasing was observed at around 493 nm, locating at the emission edgeand approaching to the green region. The green emission comes from the fluctuation-induced localization centers. Andthe cavity-enhanced recombination played an important role in realization of lasing action. These results open upopportunities to design and fabricate semiconductor green VCSELs that are useful for wide-gamut, low consumptionpower and compact displays and projectors.
机译:使用两种不同类型的增益介质,即发射绿光的InGaN量子点(QD)有源区和发射蓝光的量子阱(QW)有源区制造了绿色垂直腔面发射激光器(VCSEL)。 \ r \ nVCSEL具有双电介质DBR,并且在两种类型的VCSEL中均观察到了室温(RT)连续波(CW)激射。对于QD VCSEL,获得了从491.8到565.7 nm的不同波长的激光,覆盖了“绿色间隙”的大部分。可以通过调节腔的长度来控制激光波长,并且该器件具有小于1 kA / cm〜2的低阈值电流。对于QW VCSEL,有源层的发射峰约为445nm,主要为蓝色。然而,在约493 nm处观察到激光,位于发射边缘\ r \ n,并接近绿色区域。绿色发射来自波动引起的本地化中心。而且,腔增强复合在实现激光作用中起着重要作用。这些结果为设计和制造可用于宽色域,低功耗,紧凑型显示器和投影仪的半导体绿色VCSEL开辟了新的机遇。

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  • 来源
    《Gallium Nitride Materials and Devices XIV》|2019年|109181H.1-109181H.7|共7页
  • 会议地点 0277-786X;1996-756X
  • 作者单位

    Department of Electronic Engineering, Xiamen University;

    Xiamen, China;

    Department of Electronic Engineering, Xiamen University;

    Xiamen, China;

    Department of Electronic Engineering, Xiamen University;

    Xiamen, China;

    Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou, China;

    Department of Electronic Engineering, Xiamen University;

    Xiamen, China;

    Department of Electronic Engineering, Xiamen University;

    Xiamen, China;

    Department of Electronic Engineering, Xiamen University;

    Xiamen, China bzhang@xmu.edu.cn;

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  • 正文语种 eng
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