Multiaxis interferometric system for positioning in nanometrology

摘要

We present a system for dimensional nanometrology based on scanning probe microscopy techniques (primarily atomic force microscopy, AFM) for detection of sample profile combined with interferometer controlled positioning. The interferometric setup not only improves resolution of the position control but also ensures direct traceability to the primary etalon of length. The system was developed to operate at and in cooperation with the Czech metrology institute for calibration purposes and nanometrology. The interferometers are supplied from a frequency doubled Nd:YAG laser stabilized by linear absorption spectroscopy in molecular iodine and the interferometric configuration controls the stage position in all six degrees of freedom.