OPTICAL ABSORPTION IN APCVD METAL OXIDE THIN FILMS

摘要

The optical absorption in APCVD thin films of MoO_3, WO_3 and mixed MoO_3-WO_3 was studied in the range 300-850 nm, by spectrophotometry. Annealing at 400℃ resulted in an increased absorption in mixed oxide films, while for the MoO_3 and WO_3 films a slight decrease was registered. All films, in the as-deposited and annealed states, have optical band gap energies in the range 2.55-3.2 eV, and refractive indices from 1.8 to 2.6.