首页> 外文会议>NATO Advanced Study Institute on Nanoengineered Nanofibrous Materials; 20030901-12; Belek-Antalya(TR) >INFLUENCE OF PLD AND CVD EXPERIMENTAL GROWTH CONDITIONS ON CARBON FILM NANO- STRUCTURE EVOLUTION
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INFLUENCE OF PLD AND CVD EXPERIMENTAL GROWTH CONDITIONS ON CARBON FILM NANO- STRUCTURE EVOLUTION

机译:PLD和CVD实验生长条件对碳膜纳米结构演变的影响

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Owing to their outstanding properties, many research efforts have been focused on the growth and application of carbon based materials, mainly single or multi-wall carbon nano-tubes, nano-horns and cones, fibres . Nano-structured carbon films have also been proved to be a very promising field emitting material, providing the nano-graphene structure have the constituting basal plane oriented perpendicular to the substrate. Pulsed Laser Deposition (PLD) and Chemical Vapour Deposition (CVD) methods have been used to prepare carbon films of different nano-structure ranging from amorphous carbon to nano-clustered graphite and nano-wires. The influence of experimental conditions (v.z. deposition system and parent species, substrate heating, working pressure, inert sustaining gases, RF or DC plasma assisted deposition) on the carbon atom clustering, particle aggregation and structure evolution has been thoroughly analysed. Nd:YAG pulsed laser ablation of a graphite target produced nano-structured films when assisted by plasma or at high substrate temperature. Hot Filament CVD was able to grow nano-graphite "petal"-like structures vertically oriented at moderate substrate temperature ( 650℃) and sharp graphite tips and cones at high T (1650 ℃). The presence of a DC plasma was able to produce big "urchin" structures characterised by long, entangled, tubular wires (stripes), without any catalyst addition. The film morphology have been characterised by SEM; film quality and nano-particle dimension have been estimated be Raman spectroscopy. Field emission properties have been measured by a planar / spherical configuration.
机译:由于其优异的性能,许多研究工作集中在碳基材料的生长和应用上,主要是单壁或多壁碳纳米管,纳米角和锥,纤维。如果纳米石墨烯结构具有垂直于基板取向的构成基面,那么纳米结构的碳膜也被证明是非常有前途的场发射材料。脉冲激光沉积(PLD)和化学气相沉积(CVD)方法已用于制备具有不同纳米结构的碳膜,该碳膜的范围从无定形碳到纳米簇状石墨和纳米线。彻底分析了实验条件(v.z.沉积系统和母体,衬底加热,工作压力,惰性维持气体,RF或DC等离子体辅助沉积)对碳原子团聚,颗粒聚集和结构演变的影响。 Nd:YAG脉冲激光烧蚀石墨靶时,在等离子体辅助下或在较高的基板温度下会产生纳米结构的膜。热丝化学气相沉积法能够在中等衬底温度(650℃)下垂直取向形成纳米石墨“花瓣”状结构,并在高温(1650℃)下生长出尖锐的石墨尖端和锥状结构。 DC等离子体的存在能够产生大型的“顽童”结构,其特征在于缠结的管状长丝(条纹),而无需添加任何催化剂。膜的形貌已通过SEM表征。薄膜质量和纳米粒子尺寸已通过拉曼光谱法估算。场发射特性已经通过平面/球形配置进行了测量。

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