Institute of Solid State Physics, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee Blvd,1784 Sofia, Bulgaria;
Institute of Engineering, Autonomous University of Baja California, Benito Juarez Blvd. esc. Calle de la Normal, s, C. P. 21280 Mexicali, B. C, Mexico;
Institute of Engineering, Autonomous University of Baja California, Benito Juarez Blvd. esc. Calle de la Normal, s, C. P. 21280 Mexicali, B. C, Mexico;
Institute of Solid State Physics, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee Blvd,1784 Sofia, Bulgaria;
Institute of Engineering, Autonomous University of Baja California, Benito Juarez Blvd. esc. Calle de la Normal, s, C. P. 21280 Mexicali, B. C, Mexico;
Institute of Engineering, Autonomous University of Baja California, Benito Juarez Blvd. esc. Calle de la Normal, s, C. P. 21280 Mexicali, B. C, Mexico;
Centro de Nanociencias y Nanotecnologia, Universidad Nacional Autonoma de Mexico, P.O. Box,356, 22800 Ensenada, B.C. Mexico;
Center for Microanalysis of Materials, Frederick Seitz Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801, USA;
Center for Microanalysis of Materials, Frederick Seitz Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801, USA;
sputtered sio_x; spectroscopic ellipsometry; VASE; AFM;
机译:热退火对溅射富硅氧化硅薄膜性能的影响
机译:通过反应磁控溅射沉积和快速热退火制备的富含含硅氧化硅膜的电子发射性能
机译:溅射在硅(111)衬底上的二氧化铈薄膜的快速热退火:加热速率对微结构和电性能的影响
机译:热退火对溅射Si富硅氧化硅膜性能的影响
机译:氢退火和衬底温度对射频溅射氧化锌薄膜性能的影响
机译:热退火对通过射频磁控溅射获得的锆掺杂MgXZN1-XO膜性能的影响
机译:通过反应磁控溅射沉积和快速热退火制备的富含含硅氧化硅膜的电子发射性能