Selected interlayer of diamond deposition on γ-TiAl intermetallic compounds prepared by microwave-plasma assisted CVD

摘要

Several diamond coatings were performed on γ-TiAl substrates by a microwave-plasma assisted CVD, which were made directly to the substrate and indirectly to the TiC, Ti_5Si_3, Al_2O_3+TiO_2 and Si layers on the substrate. The direct coatings suffered from severe delamination and cracks. The deposited layers on TiC and Ti_5Si_3 layers partially delaminated, while those on Al_2O_3+TiO_2 and Si layers adhered well without delamination. All the diamond films deposited were characterized using scanning electron microscopy, Raman spectroscopy, and X-ray diffraction. Raman spectra showed that poly- and nano-crystalline diamond films were obtained for the coatings of γ-TiAl.