Abstract: There presently exists a need for an analytical methodthat can accurately measure both the grain size andthickness of aluminum films deposited under a varietyof deposition conditions. In particular, it isespecially desirable to be able to make suchmeasurements with high spatial resolution and in anoncontact and nondamaging manner. Using a laser-basedthermal wave system with highly focused beams (1 $muspot size) a technique has been developed to satisfythis need. An argon-ion pump beam intensity- modulatedin the MHz regime generates thermal waves which aredetected via the modulated reflectance of anonmodulated HeNe probe beam. Due to the roughness ofthe film's surface it is necessary to collect asignificant amount of data. Information about thethickness of the film is then based on the averagethermal wave signal and grain size information isobtained from the scattering of the thermal wave signalas well as from scattering in the dc reflected argonand HeNe beams. A detailed description of themeasurement and the theory behind the analysis ispresented in this paper. !4
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