DEVELOPMENT OF A SILICON CARBIDE MICRO FOUR-POINT PROBE

摘要

The process development and fabrication of a cantilever-based micro four-point probe (MFPP) is presented. This device will allow for characterization of film resistance with micrometer-scaled resolution. The probe is designed for deployment on a commercial AFM. The cantilevers are made of amorphous silicon carbide (a-SiC) and the probe body using SU8. The probe consists of two sets of cantilevers, with integrated tips, on parallel planes 8.68 μm apart. This allows the probe to contact the surface in a square array and perform a van der Pauw type measurement. Studies to characterize, pattern and dope the a-SiC have been performed to utilize silicon carbide as both the cantilever structural material as well the conductive element in the sensor. The MFPP has been fabricated and some preliminary tests have been performed.