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Optical Constant of Thin Gold Films: Structural Morphology Determined Optical Response

机译:薄金膜的光学常数:结构形态确定光学响应

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The performance of metal-based devices is limited by ohmic losses in the metal, which are determined by electron scattering. The structural properties of gold thin films also play an important role in the film quality, which may affect its' optical properties and the overall capability of the device. At the same time, metal films of different thicknesses are needed for different applications and, since these films are polycrystalline, their internal properties and surface roughness can greatly vary from one thickness to another. In this work, we study, using atomic force microscopy and spectroscopic ellipsometry, the structural morphology and optical properties of polycrystalline gold thin films (fabricated by e-beam deposition at a low sputtering rate smooth gold) in the thickness range of 20 - 200 nm. By extracting the real and imaginary dielectric function and the Drude parameter of electron relaxation rate we demonstrate that the optical losses increase mainly when the film thickness gets lower than 66 nm. Our results reveal that the thickness-dependent contribution is inversely proportional to the film thickness. The experimental results are confirmed by the theoretical model, which predicts optical losses based on structure of the gold films.
机译:金属基器件的性能受金属中的欧姆损耗的限制,这通过电子散射确定。金薄膜的结构性能也在薄膜质量中起重要作用,这可能影响其“光学性质和装置的整体能力”。同时,不同应用需要不同厚度的金属膜,因为这些薄膜是多晶的,它们的内部性能和表面粗糙度可以从一个厚度到另一个厚度大大变化。在这项工作中,我们使用原子力显微镜和光谱椭圆形测定法研究了多晶金薄膜的结构形貌和光学性质(通过在低溅射率光滑的金色沉积中制造的)厚度范围为20-200 nm 。通过提取真实和虚部的介电功能和电子松弛率的磨损参数,我们证明了光学损耗主要在膜厚度低于66nm时增加。我们的研究结果表明,厚度依赖性贡献与膜厚度成反比。实验结果由理论模型确认,其基于金膜的结构预测光学损耗。

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