首页> 外文会议>Joint IEEE International Symposium on the Applications of Ferroelectrics >Effect of N-well for single event upset in 65 nm CMOS triple-well technology in 6T SRAM CELLS
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Effect of N-well for single event upset in 65 nm CMOS triple-well technology in 6T SRAM CELLS

机译:6T SRAM细胞65nm CMOS三井技术在65nm CMOS三井技术中对单一事件的影响

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摘要

In this paper, the effect of N-well for single event upset in 65nm CMOS triple well technology SRAM CELLS is studied. The study shows that charge sharing collection increases because of the existing of N-well in triple-well technology. While it restrains the single event upset and reduces the soft error rate (SER) compared with the SRAM whose NMOS are dual-well technology devices. The result of this work can provide a way to protect integration circuits from single event effect (SEE) and soft errors.
机译:在本文中,研究了N-孔对65nm CMOS三重井技术SRAM细胞的单一事件镦粗的影响。该研究表明,由于在三倍技术中存在的N阱存在,费用共享收集增加。虽然它限制了单个事件的损坏并降低了与镍铬酚是双井技术设备的SRAM相比的软错误率(SER)。此工作的结果可以提供一种方法来保护集成电路免受单一事件效果(请参阅)和软错误。

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