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ZnTe Compound Semiconductor Thin Films Electrodeposited from Acidic Aqueous Solution

机译:Znte化合物半导体薄膜从酸性水溶液中电沉积

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Amorphous ZnTe compound semiconductor thin films can be electrodeposited from acidic aqueous solution containing citric acid. . Chemical composition of ZnTe thin films electrodeposited at -0.8 V is close to the stoichiometry composition and optimum cathode potential for electrodeposition of ZnTe is determined to ca. -0.8 V which is under potential range to the equilibrium potential of Zn. Film thickness of electrodeposited ZnTe is ca. 3 μm and the growth rate of ZnTe thin films is estimated to be ca. 3 nm?sec~(-1). Surface appearance of as-deposited ZnTe thin films looks black and that is composed of an amorphous phase. On the other hand, the thin films with annealing at 683 K turn reddish brown and that is composed of binary crystalline phases. Optical absorption is observed in the range less than ca. 550nm in the deposit with the binary phases of ZnTe and Te. Band gap energy of the deposits, which are annealed for 1 to 5 hours, is ca. 2.25 eV. Resistivity of as-deposited thin films is ca. 10~6 Ωm. On the other hand, that of the annealed thin films is ca. 10~(-1) Ωm which is smaller than the value of ZnTe single crystal.
机译:无定形Znte化合物半导体薄膜可以从含柠檬酸的酸性水溶液中电沉积。 。在-0.8V下电沉积的ZnTe薄膜的化学成分接近化学计量组合物,并确定ZnTe电沉积的最佳阴极电位。 -0.8 V在Zn的平衡潜力范围内。电沉积ZnTe的膜厚度是Ca。 3μm和ZnTe薄膜的生长速率估计为CA。 3 nm?sec〜(-1)。沉积的ZnTe薄膜的表面外观看起来是黑色的,并且由非晶相组成。另一方面,薄膜在683k时退火变为红褐色,并且由二元晶相组成。在小于CA的范围内观察到光学吸收。用Znte和Te的二进制阶段沉积物550nm。沉积物的带隙能量,其退火1至5小时,是CA。 2.25 ev。沉积薄膜的电阻率是Ca。 10〜6Ωm。另一方面,退火的薄膜是Ca. 10〜(-1)ωm小于Znte单晶的值。

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