Precision patterning sub-nanometrology relied up a pico-meter quantum sensing approach

摘要

A precision patterning sub-nanometrology in a single quantum state such as a single electron, a single photon, a single atom, a single molecule, etc. leads an international technology roadmap for semiconductors (ITRS) to quantum noise limits, where quantum effects occur in a sub-nanometer (sub-nm) real space with ultra-fast time and frequency resolutions. Classical metrology technologies face challenges, due to failure to achieve such a transient resolution. In response to the cutting-edge issue, a precision patterning sub-nanometrology relied up a pico-meter quantum sensing approach was developed to satisfy a precision sub-nanometrology need, wherein a conducting atomic force microscopy (C-AFM) coupling a laser micro-photoluminescence (micro-PL) spectroscopy was a state-of-the art height-current-phase uncertainty correlation reproducible traceable precision sub-nanometrology technology with a powerful pico-meter (pm) spatial resolution associated with transient quantized pico-ample differential current-nominal voltage resolutions relied up a quantum electrical measurement triangle principle. A self-assembled vertical nanomedicine photoluminescence crystal array with an atomic interference effect was revealed in Figure 1 and a quantum regenerative amplification principle was discussed. It is concluded that a precision patterning sub-nanometrology relied up a pico-meter quantum sensing approach provides a new impetus for an integrated circuit scaling and paves a way towards developing quantum-level self-alignment patterning technologies to support precision quantum sensing and metrological device innovations and beyond, which are important for quality-profit upgrades and global industry developments.