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Evolutionary Optimization for Plasmon-Assisted Lithography

机译:等离子体辅助光刻的进化优化

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摘要

We show, through an example in surface-plasmons assisted nano-lithography, the great influence of the definition of the objective function on the quality of the solutions obtained after optimization. We define the visibility and the contrast of a surface-plasmons interference pattern as possible objective functions that will serve to characterize the geometry of a nano-structure. We optimize them with an Elitist Evolution Strategy and compare, by means of some numerical experiments, their effects on the geometrical parameters found. The maximization of the contrast seems to provide solutions more stable than those obtained when the visibility is maximized. Also, it seems to avoid the lack-of-uniqueness problems resulting from the optimization of the visibility.
机译:我们通过辅助纳米光刻中的示例来展示,目的函数定义对优化后获得的溶液质量的影响很大。我们定义了表面等离子体干涉图案的可视性和对比度,作为可能用于表征纳米结构的几何形状的物体功能。我们通过精英演化策略优化它们,并通过一些数值实验比较它们对发现的几何参数的影响。对比度的最大化似乎提供了比当能见度最大化时获得的溶液更稳定。此外,似乎避免了由于优化知识而导致的唯一性问题。

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