Multi-Scale Soft-Lithographic Lift-Off and Grafting (MS-SLLOG) Process for Active Polymer Nanophotonic Device Fabrication

摘要

This paper reports a new microfabrication process named "Multi-Scale Soft-Lithographic Lift-Off and Grafting (MS-SLLOG)" used to construct active nanophotonic devices. MS-SLLOG is a low-temperature (less than 150°C) microfabrication technique that allows soft lithographically molded polymer micro-structures to be integrated together with silicon-based microelectromechanical systems (MEMS) structures to perform active control. Moreover, MS-SLLOG process allows us to achieve a hierarchical device structure seamlessly accommodating feature sizes ranging from tens of nanometer to sub-millimeters on a single chip for nanophotonic structure integration. To demonstrate the MS-SLLOG process capability, a strain-controlled micro-optical grating device is fabricated and experimentally characterized. The experimental results successfully show the operation of an active polymer nanophotonic device fabricated by the MS-SLLOG process.