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Comparative study of the structural and optical properties of CIS films prepared by RF-magnetron sputtering and selenization of elemental layers

机译:RF-磁控溅射制备的CIS膜结构和光学性质的比较研究及元素层硒化

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We report on a study where the properties of films obtained by RF-magnetron sputtering and by Selenization of elemental precursor layers are analysed by Raman scattering, x-ray diffraction and optical measurements. Three routes were followed to prepare CIS films on glass. CIS type-I was prepared by selenization at various temperatures, CIS type-II was prepared by RF-magnetron sputtering on room temperature substrate followed by annealing at 450°C in air for 10 mm and CIS type-III was prepared by RF-magnetron sputtering on a substrate at a temperature ranging from 200°C up to 500°C with a post-deposition annealing in the same conditions as for CIS type-II. Correlating the results from x-ray diffraction with the Raman scattering and optical measurements it was possible to establish unequivocally the formation of CIS with the chalcopyrite structure for CIS type-I at 400°C. Through the same procedure it was possible to establish a way to produce CIS type-II with the chalcopyrite structure. A high density of defects was inferred from the transmission results. Finally the growth dynamics of CIS type-III was studied. It was observed a structural/compositional transition around substrate temperature of 300°C. It was observed that all the films had a sphalerite structure even for the highest substrate temperatures. It was establish the need far a post-deposition annealing to obtain CIS type-III with the chalcopyrite structure. The Raman scattering was found to be a very sensitive technique that allowed us to uncover a difference in the CIS type-I and II with the chalcopyrite structure.
机译:我们通过拉曼散射,X射线衍射和光学测量来分析由RF-agageCron溅射获得的薄膜的性能和元素前体层的酶化的研究报告。遵循三条路线以在玻璃上准备顺式胶片。通过各种温度通过硒化制备顺式型-i,通过RF-磁控溅射在室温衬底上制备顺式-II,然后在450℃下退火10mm,通过RF-磁控管制备CIS-III。在与CIS-II的相同条件下,在与CIS-II相同的条件下,在高达500℃的温度下溅射在200℃至500℃的温度下。将X射线衍射与拉曼散射和光学测量结果相关,可以明确地建立CIS与CIS型-1的氯铜矿结构在400℃下形成CI。通过相同的程序,可以建立一种方法来生产CIS Type-II与核偶结构。从传输结果推断出高密度的缺陷。最后研究了CIS-III的生长动态。观察到底物温度为300℃的结构/组成过渡。观察到,即使对于最高的基板温度,所有薄膜也具有闪锌矿结构。它建立了需要遥远的沉积退火,以获得具有硫代铜矿结构的顺式-III。发现拉曼散射是一种非常敏感的技术,使我们能够揭示CIS Type-I和II的差异,用核偶结构。

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