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Electrodeposition of Al-W-Mn Alloy from Lewis Acidic AlCl_3-1-Ethyl-3-methylimidazolium Chloride Ionic Liquid

机译:Lewis酸性ALCL_3-1-乙基-3-甲基咪唑氯离子液体的Al-W-Mn合金电沉积

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The electrodeposition of non-equilibrium ternary Al-W-Mn alloys was investigated in the Lewis acidic 66.7-33.3 mol% aluminum chloride–1-ethyl-3-methylimidazolium chloride (AlCl_3–[C_2mim]Cl) ionic liquid (IL) with K_3[W_2Cl_9] and MnCl_2 to improve the properties of binary Al-W alloy electrodeposits. The Al-W-Mn alloys were electrochemically deposited on Cu substrates. The W content in the Al-W-Mn alloys monotonically decreased with increasing the applied current density independently of the K_3[W_2Cl_9] and MnCl_2 concentration in the IL solution. The Mn content in the ternary alloys was significantly affected by the electrodeposition condition. The XRD and EDS analyses revealed that the Al-W-Mn alloys prepared in this research have non-equilibrium solid solution and amorphous phases without chloride contamination. The surface morphology was improved by adding Mn to the Al-W alloy, and the pitting potential of the Al-W-Mn alloy surpassed that for the electrodeposited Al-W and Al-Mn binary alloy systems.
机译:在Lewis酸性66.7-33.3mol%氯化铝-1-乙基-3-甲基咪唑(AlCl_3- [C_2mim] Cl)离子液体(IL)中,研究了非平衡三元族族锰合金的电沉积。用K_3 [W_2CL_9]和MNCL_2改善二元Al-W合金电源的性质。在Cu基材上电化学沉积Al-W-Mn合金。 Al-W-Mn合金中的W含量随着IL溶液中的K_3 [W_2Cl_9]和MnCl_2浓度而增加施加的电流密度,单调地降低。三元合金中的Mn含量受电沉积条件的显着影响。 XRD和EDS分析显示,本研究中制备的Al-W-Mn合金具有非平衡的固溶体和无定形相,没有氯化物污染。通过向Al-W合金添加Mn,改善了表面形态,并且Al-W-Mn合金的蚀电位超过了电沉积的Al-W和Al-Mn二元合金系统的蚀力。

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