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Temperature Dependent Internal Friction Behavior of Single Crystal Germanium Studied by the Impulse Excitation Technique

机译:脉冲励磁技术研究单晶锗的温度依赖性内部摩擦行为

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The anelastic relaxation process in crystalline solids is influenced by various mechanisms including a.o. diffusion of point defects, dislocation formation, movement and multiplication. To analyze the type and concentration of relaxing units participating in a particular thermally activated process, measuring the temperature dependent internal friction is a well-known approach. In the present study, the impulse excitation technique was used to analyze the internal friction in single crystal Ge in the <111>-, <110>- and <100>- directions between room and melting temperature. The internal friction spectra reveal up to three internal friction peaks. To interpret the observed internal friction peaks, various aspects of the peaks such as activation energy, position and relaxation time will be discussed.
机译:结晶固体的Anelastic弛豫过程受到各种机制的影响,包括A.O.点缺陷,脱位形成,移动和乘法的扩散。为了分析参与特定的热活化过程的松弛单元的类型和浓度,测量温度依赖性内部摩擦是一种众所周知的方法。在本研究中,脉冲激励技术用于分析单晶GE中的内部摩擦在室内和熔化温度之间的<110-,<100>方向上。内部摩擦谱显示出最多三个内部摩擦峰。为了解释观察到的内部摩擦峰,将讨论诸如激活能量,位置和松弛时间的峰的各个方面。

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