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Formation of two-dimensional photonic crystals by electron-beam lithography

机译:通过电子束光刻形成二维光子晶体

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摘要

The approach to formation of two-dimensional photonic crystals with preset sizes of elements by the electron-beam lithography (EBL) is presented. The main problems appearing during formation of these structures are considered.
机译:提出了通过电子束光刻(EBL)预设元件的二维光子晶体形成二维光子晶体的方法。考虑了在形成这些结构期间出现的主要问题。

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