Hydrofluoric acid modifications of graphene films

摘要

In the present work, we report on fluorination of multilayer graphene by means of HF treatment, which results in dramatic changes in its structural and electrical properties. This statement is based on transport measurements, Raman spectroscopy and atomic force electron microscopy. It is found that the local regions of fluorographene appear on the graphene films surface after hydrofluoric acid treatment of few layer graphene. Fluorine ions are found to require for the fluorination reactions. Periodic nanoswell relief with 100 nm and 10 nm in diameter and height respectively had formed on the surface of graphene films after the HF treatment.