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Photoluminescence Recovery after its Quenching by Carrier Injection in Partially Oxidized Porous Silicon

机译:通过载体注射在部分氧化多孔硅中淬火后的光致发光回收

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Recently, we have shown how photoconduction can be used to monitor the evolution of porous silicon(PSi) in HF solutions (dissolution; photo-dissolution) . The principle is based on the photocurrentbeing a signature of light transmission through PSi and thus probing changes in optical absorption. Here,we use the photoconduction technique to study the electrochemical oxidation (ECO) of p-type PSi and thephenomenon of photoluminescence (PL) quenching triggered by electron injection from the substrate. Wefocus on (ⅰ) quantum confinement effects during ECO and (ⅱ) PL recovery after stopping electron injection.(ⅰ) was successfully shown in the photocurrent evolution obtained with different light sources, confirmingthat ECO proceeds by oxidizing selectively first large nanocrystallites and later on smaller ones. For (ⅱ),the effect of oxide level, emission energy, level of electron injection and electric polarization were studied.In our experiments, electron injection was performed by reverse biasing the p-type PSi/Substratejunction under illumination at 670 nm. This light was mainly absorbed in the substrate and not much in PSi.Then, electron-hole pairs generated in the space-charge-region were separated by the electric field there andelectrons could penetrate into PSi and trigger PL quenching by Auger mechanism [3]. After stoppingillumination and voltage application, the PL recovery was monitored as a function of time. The recoverytime was quite short for non-oxidized PSi but became longer as the oxide level was increased, reachingminutes in some cases, as shown in Fig. 1. At an oxide level where the electrical contact between thesubstrate and PSi was broken, no electron injection could be achieved and no PL quenching could beobserved.
机译:最近,我们已经表明了光电电流如何用于监测多孔硅的演变(PSI)在HF溶液中(溶解;光溶解)。原理基于光电流通过PSI是光传输的签名,从而探测光学吸收的变化。这里,我们使用光电通道技术来研究P型PSI的电化学氧化(ECO)和通过电子注入底物触发的光致发光(PL)淬火现象。我们重点关注(Ⅰ)勘察期间的量子限制效应及(Ⅱ)PL恢复停止电子注射。(Ⅰ)在用不同光源获得的光电流进化中成功显示,确认ECO通过选择性地氧化第一大纳米晶体并较低的较小纳米晶体进行。对于(Ⅱ),研究了氧化物水平,发射能量,电子注射水平和电子极化水平的影响。在我们的实验中,通过反向偏置p型PSI /衬底进行电子注入在670nm下照明的结。这种光线主要吸收在底物中,并且在PSI中并不多。然后,在空间电荷区域中产生的电子空穴对被那里的电场分开电子可以穿透PSI并通过螺旋钻机制触发PL淬火[3]。停止后照明和电压施加,PL回收被监测为时间的函数。恢复非氧化PSI的时间非常短,但随着氧化物水平的增加,达到越来越越来越久在某些情况下分钟,如图1所示。在氧化物水平的情况下衬底和psi被破坏,可以实现电子注入,并且没有PL淬火可能是观察到的。

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