Numerical Analysis of AIMD Lead Tolerances Using the Lead Electromagnetic Model

摘要

Influence of lead tolerances on the RF-induced power deposition (P) near a lead electrode was analyzed using the lead electromagnetic model and two sets of incident electric fields (Etan) with different profiles. Our results indicate that tolerance analysis shall be done for all lead lengths and clinically relevant Etan because the sensitivity of P to a given variation of the lead properties can differ by an order of magnitude.