首页> 外文会议>Conference on Lasers and Electro-Optics >Direct comparison of second and third harmonic generation in mono- and few-layer MX2 (M=Mo, W; X=S, Se) by multiphoton microscope
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Direct comparison of second and third harmonic generation in mono- and few-layer MX2 (M=Mo, W; X=S, Se) by multiphoton microscope

机译:用多光子显微镜直接比较单层和多层MX2(M = Mo,W; X = S,Se)中的二次谐波和三次谐波

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We present a comprehensive study of second harmonic generation (SHG) and third harmonic generation (THG) from single- and few-layer transition metal dichalcogenides (MoS2, MoSe2, WS2 and WSe2). We measure SHG and THG from these materials with a multiphoton microscope with linearly polarized 1560 nm femtosecond excitation. We find that SHG from monolayer MoSe2 under 1560 nm excitation is more than four times stronger than that of other studied materials. This can be attributed to resonant enhancement of SHG in MoSe2.
机译:我们目前对由单层和多层过渡金属二卤化物(MoS2,MoSe2,WS2和WSe2)产生的二次谐波(SHG)和三次谐波(THG)进行全面研究。我们用线性偏振1560 nm飞秒激发的多光子显微镜测量了这些材料的SHG和THG。我们发现,单层MoSe2在1560 nm激发下的SHG强度是其他研究材料的四倍以上。这可以归因于MoSe2中SHG的共振增强。

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