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Selector devices for 3-D cross-point ReRAM

机译:3-D交叉点ReRAM的选择器设备

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To integrate cross-point (4F2) ReRAM device array, we need to develop bi-directional selector device to suppress the sneak current path through the unselected devices. Although various candidates with selector properties have been recently reported, several problems such as insufficient current density at set/reset operations for nano-scale devices, low selectivity, and poor endurance have been remained. In this talk, we report two types of selector devices, threshold switching device based on insulator-metal transition (IMT) and multi-layered tunneling oxide device for cross-point ReRAM application. We propose the feasibility for 3-D vertical 1S-1R type ReRAM for future ultra-high density memory applications.
机译:为了集成交叉点(4F2)ReRAM器件阵列,我们需要开发双向选择器器件以抑制通过未选择器件的潜电流路径。尽管最近已经报道了具有选择器特性的各种候选物,但是仍然存在一些问题,例如在纳米级器件的设置/重置操作时电流密度不足,选择性低以及耐久性差。在本次演讲中,我们报告了两种选择器器件:基于绝缘体-金属过渡(IMT)的阈值开关器件和用于交叉点ReRAM应用的多层隧道氧化物器件。我们提出了3-D垂直1S-1R型ReRAM在未来超高密度存储应用中的可行性。

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