Electroconductive properties of nanodimensional CoSbx(30 nm)/SiO2(100 nm)/Si(001) film compositions — Functional elements of thermoelectrics

摘要

This paper is devoted to the study of the effect of deposition conditions and heat treatment on the structure and the phase composition and electroconductive properties of nanodimensional CoSbx(30 nm)/SiO2(100 nm)/Si(001) (where x = 3; 3.5) film compositions (NFC''s). The resistance dependence on temperature of NFC''s under investigation depends on the phase composition of a film and has a semiconductor character.