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Techniques to characterize the structure of adhesive/dentin interfaces

机译:表征粘合剂/牙本质界面结构的技术

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@@Wet bonding technique [1] which involves separate acid etching and rinsing steps has led to higher bondstrength by preventing the collapse of demineralized dentin and enhancing the infiltration of adhesive intocollagen networks, as a result of wet bonding, a ca. 7 microns adhesive/dentin (a/d) interface will be formed. Thecontemporary self-etching adhesives/primers were designed to combine both the etching function and theresin-forming function, thus eliminating rinsing steps, at this case, a ca. 3 microns adhesive/dentin interface canbe formed. Compared to total-etch adhesives, self-etching adhesives are generally more user-friendly, lesstechnique sensitive and easer in achieving a hermetic seal. [2,3]. The structure of a/d interface plays a veryimportant role in determining the bonding quality. Many techniques have been employed to characterize thestructure of a/d interfaces. Such as SEM, TEM, staining method, SAM and micro-Raman and micro-tensile test.
机译:湿粘合技术[1]涉及到分开的酸蚀和漂洗步骤,通过防止脱矿质牙本质的崩塌并增强粘合剂的渗透性,从而提高了粘合强度。将形成7微米的粘合剂/牙本质(a / d)界面。当代的自蚀刻胶粘剂/底漆被设计为兼具蚀刻功能和形成胶的功能,因此省去了漂洗步骤。可以形成3微米的粘合剂/牙本质界面。与全蚀刻胶粘剂相比,自蚀刻胶粘剂通常更易于使用,技术敏感性较低,并且在实现气密密封方面更容易。 [2,3]。 A / D接口的结构在确定键合质量方面起着非常重要的作用。已经采用了许多技术来表征a / d接口的结构。如SEM,TEM,染色法,SAM和微拉曼和微拉伸试验。

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