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Implantation and Sputtering of Ge and Si Ions into SiO2 Substrates using Electric Fields for Acceleration and Optimisation of Laser-produced Ion Streams used for Modification of Semiconductor Materials

机译:使用电场加速和优化用于半导体材料改性的激光产生离子流,将Ge和Si离子注入和溅射到SiO2衬底中

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Laser plasma has been proved to be a potential source of multiply charged ions which could support the growing demands for high-current ion beams. To optimize the efficiency of the ion implantation technology selection of proper laser beam characteristics is very important and should be investigated. With LIS, several variables can and must be controlled. The properties of ions (current densities, the ion charge state, angular and energy distributions) depend on target material and the laser energy, pulse duration and intensity on the target surface. So, the characteristics of laser-produced ion streams should be determined with the use of precise ion diagnostic methods.Based on the preliminary results for acceleration of ions produced with the use of a repetitive laser system at IPPLM the special electrostatic-acceleration system has been designed and prepared. This device permitted to accelerate ions having charge states of 1+ to energies up to ~40 keV. The movable target holder was located inside the cylindrical box connected with a high-voltage source (up to 50 kV at 50 mA). The accelerated Ge and Si ions was implanted to SiO_2/Si substrates and analyzed.This contribution is concerned mainly on the analysis and optimization of laser-produced Ge and Si ion streams as well as on investigation of the direct implantation of these ions into SiO_2 substrates. Targets were irradiated with the use of repetitive (up to 10 Hz) laser with energy up to 700 mJ in one pulse, at radiation intensities of ~10~(11) W/cm~2. The ion stream parameters were measured using the time-of-fight method. The depth of ion implantation was determined by X-Ray Photoelectron Spectroscope (XPS). After the implantation the samples were annealed in different temperatures in range of to create nanocrystal structures and then analyzed by the means of Raman Spectroscopy, Scanning Electron Microscopy (SEM) and Transmission Electron Microscopy (TEM). The work has been performed within SEMINANO project supported by EC (within 6FP).
机译:被证明的激光等离子体被证明是多电荷离子的潜在来源,其可以支持对高电流离子束的不断增长的需求。为了优化离子植入技术的效率,选择适当的激光束特性非常重要,应该研究。使用LIS,可以且必须控制几个变量。离子(电流密度,离子电荷状态,角度和能量分布)的性质取决于目标材料和目标表面上的激光能量,脉冲持续时间和强度。因此,应根据使用精确离子诊断方法确定激光产生的离子流的特性。 根据在IPPLM在IPPLM下使用重复激光系统生产的离子加速的初步结果,设计并制备了特殊的静电加速系统。该装置允许加速具有1+的充电状态的离子,其能量高达约40keV。可移动目标保持器位于与高压源(高达50kV)连接的圆柱形盒内(50mA)。将加速的GE和Si离子注入到SiO_2 / Si底物中并分析。 该贡献主要涉及激光产生的GE和Si离子流的分析和优化以及对这些离子直接植入SiO_2底物的研究。在一次脉冲中使用重复(最多10Hz)激光器的重复(最多10 Hz)激光照射靶标,在径向强度为〜10〜(11)W / cm〜2的辐射强度。使用抗击时间法测量离子流参数。离子注入深度由X射线光电子分光镜(XPS)测定。在植入后,样品在不同温度下退火以产生纳米晶体结构,然后通过拉曼光谱法分析,扫描电子显微镜(SEM)和透射电子显微镜(TEM)分析。这项工作已经在EC(6FP)支持的Seminano项目中进行。

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