Antireflection Sub-wavelength Gratings Fabricated by UV-NIL

摘要

Sub-wavelength gratings (SWGs) have been widely used in solar cells since the structure has the function of antireflection. Many researchers are fabricating SWGs on the glass substrate hoping that it can be used in display or light emit diodes (LEDs). hi this paper, an antireflection SWGs on a quartz substrate with transparent resist by nanoimprint lithography is fabricated. Nanoimprint is an emerging lithographic technology that promises high resolution, high throughput, and low cost patterning of nanostructures. A method of fabricating SWGs with high accuracy using UV-Nanoimprint lithography in an atmospheric environment was proposed. The transmittance at the wavelengths from 1 000 nm to 2000 nm were measured and compared with the same substrate without SWGs pattern. The results show that the SWGs pattern makes the transmittance increased obviously.