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Microwave reflections from a VUV laser produced plasma sheet

机译:VUV激光产生的等离子片的微波反射

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Summary form only given. A Vacuum Ultra-Violet (VUV) laser pulseis used to create a plasma sheet in a low-ionization-energy organic gas.Microwaves from a highly directive X-band horn antenna impinge on thesheet where they are reflected. A bi-static antenna system is used fortransmitting and receiving the microwave radiation. Both heterodyne andhomodyne detection systems are investigated for maximum sensitivity.Reflected signals are measured for amplitude and phase analysis.Comparable amplitude and phase shifts are noted when compared to analuminum conducting sheet placed in the same position as the plasma. Theworking gas is tetrakis(dimethylamino)ethylene (TMAE) with an ionizationenergy of 5.36 eV. The ionizing source is a VUV excimer laser operatingat 193 nanometers (6.4 eV). The laser and plasma properties arediagnosed by an optical detection system and by Langmuir probes. Thelaser beam is transformed into a sheet using VUV coated Suprasil lenses(96% transmission efficiency). A plasma sheet with a peak density of2.5×1013 cm-3 and Te=0.8 eV isformed. Additional measurements of transmitted signals are utilized todetermine plasma density and collision frequency. A computer model ofthe microwave transmission and reflection levels has been developed tooptimize reflected signal levels as a function of density and thicknessand to interpret experimental results. Comparison between theexperimental results and the model show that this system is attractivefor use as a microwave reflector
机译:仅提供摘要表格。真空紫外线(VUV)激光脉冲 用于在低电离能有机气体中形成等离子板。 来自高指向性X波段号角天线的微波撞击到 反映它们的工作表。双静态天线系统用于 发射和接收微波辐射。外差和 对零差检测系统进行了研究以获得最大灵敏度。 测量反射信号以进行幅度和相位分析。 与 铝导电片放置在与等离子相同的位置。这 工作气体是具有电离作用的四(二甲基氨基)乙烯(TMAE) 能量为5.36 eV。电离源是VUV受激准分子激光器 在193纳米(6.4 eV)。激光和等离子体的特性是 由光学检测系统和Langmuir探针诊断。这 使用VUV涂层Suprasil透镜将激光束转换为薄片 (96%的传输效率)。等离子片的峰值密度为 2.5×10 13 cm -3 且T e = 0.8 eV为 形成。传输信号的附加测量用于 确定等离子体密度和碰撞频率。的计算机模型 微波的透射和反射水平已经发展到 根据密度和厚度优化反射信号电平 并解释实验结果。之间的比较 实验结果和模型表明该系统具有吸引力 用作微波反射器

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