A methodology for concurrent fabrication process/cell libraryoptimization

摘要

The paper presents a methodology for concurrently optimizing an ICfabrication process and a standard cell library in order to maximizeoverall yield. The approach uses the Concurrent Subspace Optimization(CSSO) algorithm, which has been developed for general coupled,multidisciplinary optimization problems. An example is provided showingthe application of the algorithm to optimizing a mixed analog/digitallibrary on a CMOS process