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A new punch through IGBT having a new N-buffer layer

机译:具有新的N缓冲层的新型穿通IGBT

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摘要

IGBTs based on the NPT (nonpunch through) design approach exhibit excellent safe operating area and short circuit endurance, a positive temperature coefficient of on-state voltage over the operating current range, and low silicon cost. These merits have supported the development and commercialization of NPT IGBTs above the 1200 Volt class. However, the need for quite thin silicon to obtain competitive on-state losses at 1200 volt and below classes has hindered the use of the NPT approach in this area. A new punch through (PT) IGBT has been developed which exhibits the merits of the NPT approach, rugged SOA and short circuit endurance, while also having a better trade-off relation between on-state voltage and turn-off loss than either existing NPT or third generation PT IGBT.
机译:基于NPT(非穿通)设计方法的IGBT具有出色的安全工作区和短路耐受性,在工作电流范围内导通电压的正温度系数以及较低的硅成本。这些优点为1200伏以上的NPT IGBT的开发和商业化提供了支持。但是,需要相当薄的硅来获得1200伏及以下等级的有竞争力的通态损耗,这已阻碍了NPT方法在该领域的使用。已开发出一种新型的穿通(PT)IGBT,它具有NPT方法的优点,坚固的SOA和耐短路性,同时在导通电压和关断损耗之间的折衷关系也比现有的NPT更好。或第三代PT IGBT。

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