【24h】

Analysis of near-field light intensity

机译:近场光强度分析

获取原文

摘要

Abstract: In this paper a numerical simulation is used to calculate near-field intensity by `split light beam.' The calculation proves to be valid as we apply it to the plane wave. In the case of one dimension structure such as a compact disk sample, the near-field intensity profiles show a rather complicated structure. In many cases the near-field intensity does not represent the actual surface profile. The near-field intensity is strongly modulated by the surface structure. When the distance between the sample and the probe becomes larger, some subtle perturbation is added to the intensity profile, and a shift between the surface and the intensity profile became more clear. The shift may cause some problems when we use the optical probe as a multi- function probe to do some lithograph work or to position. In this paper, a comparison between the calculation and experiment results was made.!6
机译:摘要:本文采用数值模拟方法通过“分束光束”计算近场强度。当我们将其应用于平面波时,该计算被证明是有效的。在诸如光盘样品的一维结构的情况下,近场强度分布显示出相当复杂的结构。在许多情况下,近场强度并不代表实际的表面轮廓。表面结构强烈调节了近场强度。当样品和探针之间的距离变大时,强度轮廓上会出现一些细微的扰动,并且表面和强度轮廓之间的偏移会变得更加清晰。当我们使用光学探针作为多功能探针进行一些光刻工作或定位时,这种偏移可能会引起一些问题。本文对计算结果与实验结果进行了比较。!6

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号